Wavelength Dependence of Wafer Film Thickness Measurement by Ellipsometer
Khan Salman
, Musarrat Islam, Erteza Tawsif Efaz, MD. Muntasir Rafi
Department of Electrical and Electronic Engineering (EEE) Ahsanullah University of Science and Technology (AUST) Dhaka, Bangladesh, India
Department of Electrical and Electronic Engineering (EEE) Ahsanullah University of Science and Technology (AUST) Dhaka, Bangladesh, India
Vol. 4, Issue 12 pp. 157-162 🌐 Open Access
ABSTRACT
This paper mainly represents how wavelength affects wafer thickness which has been measured by ellipsometry method. The thickness of a semiconductor wafer can desperately repercussion mechanical and electronic yield of the devices fabricated on it. As such for this particular research, the work is carried out by specific equations, correlations and compiled by MATLAB simulations. We worked for different hypothetical sample wafer and defined a range of wavelengths at which the measured thickness error will be minimum. In future this study will be useful for improving the performance of different wafer characterization techniques which will increase the usage of these circuits in electronic devices.
Keywords:
reflection coefficient; film thickness; ellipsometer; wavelength; wafer
