Wavelength Dependence of Wafer Film Thickness Measurement by Ellipsometer

Authors

  • Khan Salman Department of Electrical and Electronic Engineering (EEE) Ahsanullah University of Science and Technology (AUST) Dhaka, Bangladesh
  • Musarrat Islam Department of Electrical and Electronic Engineering (EEE) Ahsanullah University of Science and Technology (AUST) Dhaka, Bangladesh
  • Erteza Tawsif Efaz Department of Electrical and Electronic Engineering (EEE) Ahsanullah University of Science and Technology (AUST) Dhaka, Bangladesh
  • MD. Muntasir Rafi Department of Electrical and Electronic Engineering (EEE) Ahsanullah University of Science and Technology (AUST) Dhaka, Bangladesh

Keywords:

reflection coefficient; film thickness; ellipsometer; wavelength; wafer

Abstract

This paper mainly represents how wavelength affects wafer thickness which has been measured by
ellipsometry method. The thickness of a semiconductor wafer can desperately repercussion mechanical and electronic
yield of the devices fabricated on it. As such for this particular research, the work is carried out by specific equations,
correlations and compiled by MATLAB simulations. We worked for different hypothetical sample wafer and defined a
range of wavelengths at which the measured thickness error will be minimum. In future this study will be useful for
improving the performance of different wafer characterization techniques which will increase the usage of these
circuits in electronic devices.

Downloads

Published

2017-12-25

How to Cite

Khan Salman, Musarrat Islam, Erteza Tawsif Efaz, & MD. Muntasir Rafi. (2017). Wavelength Dependence of Wafer Film Thickness Measurement by Ellipsometer. International Journal of Advance Research in Engineering, Science & Technology, 4(12), 157–162. Retrieved from https://ijarest.org/index.php/ijarest/article/view/1834

Issue

Vol. 4 No. 12 (2017): Volume: 04, Issue: 12 - December, 2017.

Section

Articles